Liquid processing apparatus, liquid processing method, and storage medium
US10236192B2 · kind B2 · utility
3Cited by
3References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 20, 2014 |
| Grant date | Mar 19, 2019 |
| Priority date | — |
| Expiry date | Jul 11, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6708
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A liquid processing apparatus of the present disclosure holds and rotate a substrate in a substrate holding unit, ejects an etching liquid while moving a main nozzle of a main nozzle unit between a first position where the etching liquid reaches a center of the substrate and a second position closer to a peripheral side of the substrate than the first position, and then, ejects the etching liquid to the substrate from a sub nozzle provided at a third position closer to the peripheral side of the substrate than the first position at an ejection flow rate higher than that from the main nozzle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.