Block polymers for sub-10 nm patterning
US10239982B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Feb 22, 2017 |
| Grant date | Mar 26, 2019 |
| Priority date | — |
| Expiry date | Apr 29, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.