Carlton G. Willson
42Patents
20h-index
74Co-inventors
88Inventor score
Filing activity: Dec 3, 1979 → Feb 22, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4491628A | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone | Emerging Cross-Sectional Technologies | 643 | Expired |
| US6334960B1 | Step and flash imprint lithography | Emerging Cross-Sectional Technologies | 458 | Expired |
| US6908861B2 | Method for imprint lithography using an electric field | Electricity | 133 | Expired |
| US6719915B2 | Step and flash imprint lithography | Emerging Cross-Sectional Technologies | 130 | Expired |
| US4552833A | Radiation sensitive and oxygen plasma developable resist | Physics | 94 | Expired |
| US4657845A | Positive tone oxygen plasma developable photoresist | Physics | 76 | Expired |
| US4939070A | Thermally stable photoresists with high sensitivity | Emerging Cross-Sectional Technologies | 74 | Expired |
| US4908298A | Method of creating patterned multilayer films for use in production of semiconductor circuits and systems | Emerging Cross-Sectional Technologies | 63 | Expired |
| US6964793B2 | Method for fabricating nanoscale patterns in light curable compositions using an electric field | Performing Operations; Transporting | 54 | Expired |
| US7229273B2 | Imprint lithography template having a feature size under 250 nm | Emerging Cross-Sectional Technologies | 45 | Expired |
| US4810601A | Top imaged resists | Emerging Cross-Sectional Technologies | 42 | Expired |
| US5545509A | Photoresist composition with photosensitive base generator | Physics | 37 | Expired |
| US4397937A | Positive resist compositions | Physics | 36 | Expired |
| US4458994A | High resolution optical lithography method and apparatus having excimer laser light source and stimulated Raman shifting | Electricity | 36 | Expired |
| US5322765A | Dry developable photoresist compositions and method for use thereof | Physics | 31 | Expired |
| US4767723A | Process for making self-aligning thin film transistors | Emerging Cross-Sectional Technologies | 26 | Expired |
| US6890688B2 | Lithographic template and method of formation and use | Physics | 25 | Expired |
| US4464460A | Process for making an imaged oxygen-reactive ion etch barrier | Physics | 24 | Expired |
| US5055439A | Photoacid generating composition and sensitizer therefor | Physics | 22 | Expired |
| US5342727A | Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition | Physics | 21 | Expired |
| US4551418A | Process for preparing negative relief images with cationic photopolymerization | Physics | 20 | Expired |
| US5250395A | Process for imaging of photoresist including treatment of the photoresist with an organometallic compound | Physics | 19 | Expired |
| US4284706A | Lithographic resist composition for a lift-off process | Physics | 18 | Expired |
| US4522911A | Deep ultra-violet lithographic resists with diazohomotetramic acid compounds | Physics | 16 | Expired |
| US9223202B2 | Method of automatic fluid dispensing for imprint lithography processes | Electricity | 14 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.