Negative photosensitive composition and pattern formation method
US10241403B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2016 |
| Grant date | Mar 26, 2019 |
| Priority date | — |
| Expiry date | Mar 25, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A negative photosensitive composition including an epoxy group-containing resin; and a cationic polymerization initiator containing one or more types of the following cationic polymerization initiators: a compound represented by formula (b0-1) and a compound represented by formula (b0-2), and a cationic polymerization initiator which generates an acid having a pKa of −3 or more. In the formulae, Rb01 to Rb04 are each independently a fluorine atom or an aryl group which may have a substituent, Rb05 is a fluorine atom or a fluorinated alkyl group which may have a substituent, a plurality of Rb05's may be the same as or different from each other, q is an integer of 1 or more, and Qq+'s are each independently a q-valent organic cation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.