Tomoyuki Ando
29Patents
5h-index
57Co-inventors
72Inventor score
Filing activity: Jul 13, 1994 → Sep 13, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5877478A | Semiconductor device and method of manufacturing the same | Electricity | 24 | Expired |
| US8426551B2 | Metal thietane compound, polymerizable composition containing the compound, resin and use of the resin | Physics | 22 | Active |
| US6320078A | Method of producing benzamide derivatives | Chemistry; Metallurgy | 15 | Expired |
| US5473188A | Semiconductor device of the LOC structure type having a flexible wiring pattern | Electricity | 9 | Expired |
| US8236483B2 | Method of forming resist pattern | Physics | 5 | Active |
| US8263322B2 | Method of forming resist pattern | Physics | 4 | Active |
| US7687221B2 | Positive resist composition and resist pattern forming method | Emerging Cross-Sectional Technologies | 4 | Active |
| US7799883B2 | Norbornene-type polymers, compositions thereof and lithographic process using such compositions | Electricity | 3 | Expired |
| US7318992B2 | Lift-off positive resist composition | Physics | 3 | Expired |
| US8420718B2 | Composition, polymerizable composition, resin, optical component, and method for producing the composition | Physics | 2 | Active |
| US7125704B2 | Gluconate dehydratase | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8293864B2 | Metal thietane compound, polymerizable composition containing the compound, resin and use of the resin | Physics | 2 | Active |
| US8329838B2 | Norbornene-type polymers, compositions thereof and lithographic processes using such compositions | Electricity | 1 | Active |
| US9244354B2 | Method for producing thick film photoresist pattern | Physics | 1 | Active |
| US8957341B2 | Gas circuit breaker | Electricity | 1 | Active |
| US8349996B2 | Compound, polymerizable composition, resin, and use of the composition and the resin | Chemistry; Metallurgy | 1 | Active |
| US8697889B2 | Metal compound, polymerizable composition containing the same, resin, method for producing the resin, and use of the resin | Physics | 0 | Active |
| US10472435B2 | Polymerizable composition and novel alkyne compound | Physics | 0 | Active |
| US10241403B2 | Negative photosensitive composition and pattern formation method | Physics | 0 | Active |
| US11491772B2 | Substrate bonding method and laminated body production method | Performing Operations; Transporting | 0 | Active |
| US7749677B2 | Negative resist composition | Emerging Cross-Sectional Technologies | 0 | Expired |
| US7727701B2 | Positive resist composition and method of forming resist pattern | Emerging Cross-Sectional Technologies | 0 | Expired |
| US11415888B2 | Negative type photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, and method of producing cured film | Physics | 0 | Active |
| US8394891B2 | Additive for polymerizable composition, polymerizable composition containing the same and use of the polymerizable composition | Physics | 0 | Active |
| US8680295B2 | Process for producing bis(thietanylthio)dithiastannolane | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.