Reduced Coulomb interactions in a multi-beam column
US10242839B2 · kind B2 · utility
2Cited by
9References
20Claims
0Family size
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Key dates
| Filing date | May 5, 2017 |
| Grant date | Mar 26, 2019 |
| Priority date | — |
| Expiry date | May 5, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/061
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Performance of a multi-electron-beam system can be improved by reducing Coulomb effects in the illumination path of a multi-beam inspection system. A beam-limiting aperture with multiple holes can be positioned between an electron beam source and a multi-lens array, such as in a field-free region. The beam-limiting aperture is configured to reduce Coulomb interactions between the electron beam source and the multi-lens array. An electron beam system with the beam-limiting aperture can be used in a scanning electron microscope.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.