Patent · US Active

Charged particle beam device, charged particle beam influencing device, and method of operating a charged particle beam device

US10249472B2 · kind B2 · utility

0Cited by

3References

18Claims

0Family size

Assignee

ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · DE

Inventors

Dieter Winkler · Munich, DE
Guy Eytan · Kidron, IL
Zvi Nir · Karmei Yosef, IL

Key dates

Filing date	Jul 13, 2017
Grant date	Apr 2, 2019
Priority date	—
Expiry date	Jul 13, 2037

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2817
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A charged particle beam device is described, which includes: a beam source configured to generate a charged particle beam propagating along an optical axis (A); an aperture device with a first number of apertures configured to create a first number of beamlets from the charged particle beam, wherein the first number is five or more, wherein the apertures are arranged on a ring line around the optical axis (A) such that perpendiculars of the apertures onto a tangent of the ring line are evenly spaced. The charged particle beam device further includes an electrostatic multipole device configured to individually influence the beamlets. Further, a charged particle beam influencing device and a method of operating a charged particle beam device are described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.