Guy Eytan
14Patents
1h-index
35Co-inventors
50Inventor score
Filing activity: Jul 16, 2004 → Jul 21, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10217621B2 | Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber | Electricity | 6 | Active |
| US10910204B2 | Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber | Electricity | 0 | Active |
| US8804299B2 | Electrostatic chuck and a method for supporting a wafer | Electricity | 0 | Active |
| US10716197B2 | System, computer program product, and method for dissipation of an electrical charge | Electricity | 0 | Active |
| US11049704B1 | Cleanliness monitor and a method for monitoring a cleanliness of a vacuum chamber | Electricity | 0 | Active |
| US11810765B2 | Reactive particles supply system | Electricity | 0 | Active |
| US10249472B2 | Charged particle beam device, charged particle beam influencing device, and method of operating a charged particle beam device | Electricity | 0 | Active |
| US11189451B2 | Charged particle beam source and a method for assembling a charged particle beam source | Electricity | 0 | Active |
| US10886092B2 | Charged particle beam source and a method for assembling a charged particle beam source | Electricity | 0 | Active |
| US11264202B2 | Generating three dimensional information regarding structural elements of a specimen | Electricity | 0 | Active |
| US11921063B2 | Lateral recess measurement in a semiconductor specimen | Electricity | 0 | Active |
| US7235794B2 | System and method for inspecting charged particle responsive resist | Electricity | 0 | Expired |
| US11694869B2 | Evaluating a contact between a wafer and an electrostatic chuck | Electricity | 0 | Active |
| US11355309B2 | Sensor for electron detection | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.