Patent · US Active

Block copolymers with surface-active junction groups, compositions and processes thereof

US10259907B2 · kind B2 · utility

0Cited by

9References

12Claims

0Family size

Assignees

AZ Electronic Materials (Luxembourg) S.A.R.L. · LU
IBM Corporation · US

Inventors

Ankit Vora · San Jose, US
Eri Hirahara · Westfield, US
Joy Cheng · San Jose, US
Durairaj BASKARAN · Bound Brook, US
Orest Polishchuk · Bayonne, US
Melia Tjio · San Jose, US
Margareta Paunescu · Clinton, US
Daniel P. Sanders · San Jose, US
Guanyang Lin · Whitehouse Station, US

Key dates

Filing date	Feb 20, 2015
Grant date	Apr 16, 2019
Priority date	—
Expiry date	Aug 28, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08J2369/00
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

The present invention relates to a novel block copolymer of structure 1, wherein, A- is a block polymer chain, B is a block polymer chain, wherein, A- and B- are chemically different, covalently connected polymer chains, which are phase separable and the moiety X(Y(Z)b)a is a junction group, which comprises a surface active pendant moiety Y(Z)b wherein:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.