Inventor · San Jose, CA, US

Joy Cheng

77Patents
11h-index
84Co-inventors
77Inventor score

Filing activity: Mar 23, 2007 → Aug 9, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US7521090B1 Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films Performing Operations; Transporting 104 Active
US7521094B1 Method of forming polymer features by directed self-assembly of block copolymers Performing Operations; Transporting 74 Active
US8114306B2 Method of forming sub-lithographic features using directed self-assembly of polymers Emerging Cross-Sectional Technologies 69 Active
US9159558B2 Methods of reducing defects in directed self-assembled structures Performing Operations; Transporting 61 Active
US8226838B2 Method of forming polymer features by directed self-assembly of block copolymers Performing Operations; Transporting 33 Active
US8336003B2 Method for designing optical lithography masks for directed self-assembly Physics 29 Active
US9576817B1 Pattern decomposition for directed self assembly patterns templated by sidewall image transfer Physics 26 Active
US8828493B2 Methods of directed self-assembly and layered structures formed therefrom Physics 16 Active
US7763319B2 Method of controlling orientation of domains in block copolymer films Emerging Cross-Sectional Technologies 15 Active
US8398868B2 Directed self-assembly of block copolymers using segmented prepatterns Performing Operations; Transporting 12 Active
US8491965B2 Method of controlling orientation of domains in block copolymer films Emerging Cross-Sectional Technologies 12 Active
US8623458B2 Methods of directed self-assembly, and layered structures formed therefrom Performing Operations; Transporting 10 Active
US8856693B2 Method for designing optical lithography masks for directed self-assembly Physics 10 Active
US9107291B2 Formation of a composite pattern including a periodic pattern self-aligned to a prepattern Electricity 9 Active
US8734904B2 Methods of forming topographical features using segregating polymer mixtures Performing Operations; Transporting 8 Active
US8727135B2 Composite filtration membranes and methods of preparation thereof Chemistry; Metallurgy 8 Active
US8821978B2 Methods of directed self-assembly and layered structures formed therefrom Physics 8 Active
US9812358B1 FinFET structures and methods of forming the same Electricity 8 Active
US10073347B1 Semiconductor method of protecting wafer from bevel contamination Electricity 8 Active
US7651735B2 Orienting, positioning, and forming nanoscale structures Emerging Cross-Sectional Technologies 8 Active
US10866511B2 Extreme ultraviolet photolithography method with developer composition Physics 8 Active
US8084193B2 Self-segregating multilayer imaging stack with built-in antireflective properties Emerging Cross-Sectional Technologies 7 Active
US8715917B2 Simultaneous photoresist development and neutral polymer layer formation Performing Operations; Transporting 6 Active
US11300878B2 Photoresist developer and method of developing photoresist Electricity 4 Active
US9458353B1 Additives for orientation control of block copolymers Chemistry; Metallurgy 4 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.