Lithography apparatus and method of manufacturing a device
US10261422B2 · kind B2 · utility
Assignee
Inventors
- Norbertus Josephus Martinus Van Den Nieuwelaar
- Victor Manuel Blanco Carballo
- Casper Roderik De Groot
- Rolf Hendrikus Jacobus Custers
- David M. Phillips
- Frederik Antonius VAN DER ZANDEN
- Pieter Lein Joseph Gunter
- Erik Henricus Egidius Catharina Eummelen
- Yuri Johannes Gabriël Van De Vijver
- Bert Dirk SCHOLTEN
- Marijn Wouters
- Ronald Frank KOX
- Jorge Alberto Vieyra Salas
Key dates
| Filing date | Jun 30, 2015 |
| Grant date | Apr 16, 2019 |
| Priority date | — |
| Expiry date | Nov 7, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.