Lithography apparatus and method for operating a lithography apparatus

US10261424B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Udo Dinger · Oberkochen, DE
• Markus Holz · Aalen, DE
• Ulrich Bihr · Bopfingen, DE

Key dates

• Filing date: Dec 18, 2017
• Grant date: Apr 16, 2019
• Expiry date: Dec 18, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/7085
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. The lithography apparatus further includes an actuator device configured to displace the optical component. In addition, the lithography apparatus includes a measurement device configured to determine a position of the optical component via a measurement signal having a measurement signal frequency. The measurement signal frequency is unequal to the repetition frequency, and the measurement signal frequency is unequal to integer multiples of the repetition frequency.