Markus Holz
16Patents
2h-index
34Co-inventors
46Inventor score
Filing activity: Jan 16, 2014 → Mar 15, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10514608B2 | Method for producing an illumination system for an EUV projection exposure system, and illumination system | Physics | 3 | Active |
| US10678151B2 | Control device | Physics | 2 | Active |
| US10101507B2 | Mirror device | Physics | 1 | Active |
| US10838307B2 | Apparatus and method for operating an apparatus | Physics | 1 | Active |
| US11370020B2 | Levitation melting process | Electricity | 0 | Active |
| US10007195B2 | Device for determining a tilt angle of at least one mirror of a lithography system, and method | Physics | 0 | Active |
| US9851555B2 | Optical component | Electricity | 0 | Active |
| US10261424B2 | Lithography apparatus and method for operating a lithography apparatus | Physics | 0 | Active |
| US12164102B2 | Method for generating a mathematical model for positioning individual mirrors of a facet mirror in an optical system | Physics | 0 | Active |
| US11102850B1 | Device and method for levitation melting using induction units which are arranged in a tilted manner | Electricity | 0 | Active |
| US11048172B2 | Method for producing an illumination system for an EUV projection exposure system, and illumination system | Physics | 0 | Active |
| US10843259B2 | Casting method | Electricity | 0 | Active |
| US11789367B2 | Facet mirror for an illumination optical unit of a projection exposure apparatus | Physics | 0 | Active |
| US9721690B2 | Melting device for consolidating contaminated scrap | Physics | 0 | Active |
| US10018803B2 | Device and method for controlling positioning of multiple adjustable mirror elements in a multi-mirror arrangement | Physics | 0 | Active |
| US10514619B2 | Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.