Patent · US Active

Silica glass crucible and method for producing monocrystalline silicon using same

US10266961B2 · kind B2 · utility

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2Claims
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Assignee

Inventors

Key dates

Filing dateOct 31, 2012
Grant dateApr 23, 2019
Priority date
Expiry dateJun 12, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/1032
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Buckling of a vitreous silica crucible or fall of a sidewall into the crucible is effectively suppressed. Furthermore, dislocations in a silicon single crystal are suppressed to enhance the yield of the single crystal. The vitreous silica crucible is used to pull single-crystal silicon and includes the cylindrical sidewall having an upward-opening rim, a mortar-shaped bottom including a curve, and a round portion connecting the sidewall and the bottom. The round portion is provided in such a manner that the curvature of the inner surface thereof is gradually increased from the sidewall toward the bottom in a section passing through the rotation axis of the vitreous silica crucible.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.