Automated pattern fidelity measurement plan generation
US10267746B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 20, 2015 |
| Grant date | Apr 23, 2019 |
| Priority date | — |
| Expiry date | Feb 21, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8883
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems for determining parameter(s) of a metrology process to be performed on a specimen are provided. One system includes one or more computer subsystems configured for automatically generating regions of interest (ROIs) to be measured during a metrology process performed for the specimen with the measurement subsystem based on a design for the specimen. The computer subsystem(s) are also configured for automatically determining parameter(s) of measurement(s) performed in first and second subsets of the ROIs during the metrology process with the measurement subsystem based on portions of the design for the specimen located in the first and second subsets of the ROIs, respectively. The parameter(s) of the measurement(s) performed in the first subset are determined separately and independently of the parameter(s) of the measurement(s) performed in the second subset.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.