Method and apparatus for dynamic lithographic exposure
US10274830B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2017 |
| Grant date | Apr 30, 2019 |
| Priority date | — |
| Expiry date | Mar 7, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure relates to a dynamic lithographic exposure method, and an associated apparatus, which exposes a photosensitive material over a plurality of depths of focus respectively spanning a different region of the photosensitive material. By exposing the photosensitive material over a plurality of depths of focus, the exposure of the photosensitive material is improved resulting in a larger lithographic process window. In some embodiments, the dynamic lithographic exposure method is performed by forming a photosensitive material over a substrate. The photosensitive material is exposed to electromagnetic radiation at a plurality of depths of focus that respectively span a different region within the photosensitive material. Exposing the photosensitive material to the electromagnetic radiation modifies a solubility of an exposed region within the photosensitive material. The photosensitive material is then developed to remove the soluble region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.