Spin on hard mask material
US10290500B2 · kind B2 · utility
0Cited by
1References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2015 |
| Grant date | May 14, 2019 |
| Priority date | — |
| Expiry date | Dec 4, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31138
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.