Patent · US Active

Disconnect cavity by plating resist process and structure

US10292279B2 · kind B2 · utility

0Cited by
10References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 19, 2016
Grant dateMay 14, 2019
Priority date
Expiry dateOct 3, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/308
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

A disconnect cavity is formed within a PCB, where the disconnect cavity is electrically disconnected from a PCB landing layer. The disconnect cavity is formed using a plating resist process which does not require low flow prepreg nor selective copper etching. Plating resist is printed on a core structure selectively positioned within a PCB stack-up. The volume occupied by the plating resist forms a subsequently formed disconnect cavity. After lamination of the PCB stack-up, depth control milling, drilling and electroless copper plating are performed, followed by a plating resist stripping process to substantially remove the plating resist and all electroless copper plated to the plating resist, thereby forming the disconnect cavity. In a subsequent copper plating process, without electric connectivity copper cannot be plated to the side walls and bottom surface of the disconnect cavity, resulting in the disconnect cavity wall being electrically disconnected from the PCB landing layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.