Projection exposure tool for microlithography and method for microlithographic imaging

US10303068B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Jochen Hetzler · Aalen, DE
• Aksel Goehnermeier · Aalen, DE

Key dates

• Filing date: Jun 15, 2017
• Grant date: May 28, 2019
• Expiry date: Jun 15, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G01B2290/65
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A projection exposure tool for microlithography for imaging mask structures of an image-providing substrate onto a substrate to be structured includes a measuring apparatus configured to determine a relative position of measurement structures disposed on a surface of one of the substrates in relation to one another in at least one lateral direction with respect to the substrate surface and to thereby simultaneously measure a number of measurement structures disposed laterally offset in relation to one another.