Fluid dispense methodology and apparatus for imprint lithography
US10304690B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2017 |
| Grant date | May 28, 2019 |
| Priority date | — |
| Expiry date | Mar 22, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29L2031/34
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of can be used to generating a fluid droplet pattern for an imprint lithography process. A fluid dispense head can include a set of fluid dispense ports, wherein the fluid dispense ports are in a fixed arrangement. The method can include rotating the set of the fluid dispense ports to a rotation angle to change a fluid droplet pitch in a first direction; moving a substrate and the set of the fluid dispense ports relative to each other in a second direction substantially perpendicular to the first direction; and dispensing fluid droplets onto the substrate while moving the substrate and the set of the fluid dispense ports relative to each other. The method can be used in the formation of an electronic component within or over a semiconductor substrate. The apparatus can be configured to carry out the methods as described herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.