Dwayne L. LaBrake
28Patents
10h-index
33Co-inventors
75Inventor score
Filing activity: Oct 2, 1997 → Jan 8, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6600866B2 | Filament organizer | Physics | 206 | Expired |
| US6404956B1 | Long-length continuous phase Bragg reflectors in optical media | Electricity | 57 | Expired |
| US5912999A | Method for fabrication of in-line optical waveguide index grating of any length | Electricity | 43 | Expired |
| US6195484A | Method and apparatus for arbitrary spectral shaping of an optical pulse | Physics | 42 | Expired |
| US6035083A | Method for writing arbitrary index perturbations in a wave-guiding structure | Electricity | 34 | Expired |
| US6532327B1 | Refractive index grating manufacturing process | Physics | 24 | Expired |
| US7106939B2 | Optical and optoelectronic articles | Emerging Cross-Sectional Technologies | 14 | Expired |
| US8361371B2 | Extrusion reduction in imprint lithography | Physics | 13 | Active |
| US7256131B2 | Method of controlling the critical dimension of structures formed on a substrate | Electricity | 12 | Expired |
| US8361546B2 | Facilitating adhesion between substrate and patterned layer | Emerging Cross-Sectional Technologies | 11 | Active |
| US8641958B2 | Extrusion reduction in imprint lithography | Physics | 9 | Active |
| US6728444B2 | Fabrication of chirped fiber bragg gratings of any desired bandwidth using frequency modulation | Electricity | 6 | Expired |
| US8545709B2 | Critical dimension control during template formation | Performing Operations; Transporting | 4 | Active |
| US10580659B2 | Planarization process and apparatus | Electricity | 3 | Active |
| US9514950B2 | Methods for uniform imprint pattern transfer of sub-20 nm features | Electricity | 3 | Active |
| US8967992B2 | Optically absorptive material for alignment marks | Emerging Cross-Sectional Technologies | 2 | Active |
| US8891080B2 | Contaminate detection and substrate cleaning | Emerging Cross-Sectional Technologies | 1 | Active |
| US10606171B2 | Superstrate and a method of using the same | Electricity | 1 | Active |
| US7795132B2 | Self-aligned cross-point memory fabrication | Electricity | 1 | Active |
| US10304690B2 | Fluid dispense methodology and apparatus for imprint lithography | Performing Operations; Transporting | 1 | Active |
| US10079152B1 | Method for forming planarized etch mask structures over existing topography | Electricity | 0 | Active |
| US6917750B2 | System and method for characterizing optical devices | Physics | 0 | Expired |
| US10859913B2 | Superstrate and a method of using the same | Electricity | 0 | Active |
| US8529778B2 | Large area patterning of nano-sized shapes | Physics | 0 | Active |
| US10211051B2 | Method of reverse tone patterning | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.