Color filter uniformity for image sensor devices
US10304885B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2018 |
| Grant date | May 28, 2019 |
| Priority date | — |
| Expiry date | Apr 27, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/807
Abstract
The present disclosure is directed to a method for reducing the surface deformation of a color filter after a baking process in an image sensor device. Surface deformation can be reduced by increasing the surface area of the color filter prior to baking. For example, forming a grid structure over a semiconductor layer of an image sensor device, where the grid structure includes a first region with one or more cells having a common sidewall; disposing one or more color filters in a second region of the grid structure; recessing the common sidewall in the first region of the grid structure to form a group of cells with the recessed common sidewall; and disposing another color filter in the group of cells.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.