Patent · US Active

Cleaning device for cleaning electroplating substrate holder

US10307798B2 · kind B2 · utility

0Cited by
3References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 28, 2015
Grant dateJun 4, 2019
Priority date
Expiry dateJun 11, 2036

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D21/00
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A cleaning device for removing contamination on a substrate holder used with an electroplating cell includes an arm, a cleaning agent supplier, a nozzle and a receiver. The cleaning agent supplier is coupled to the arm and configured to supply a cleaning agent. The nozzle is coupled to the cleaning agent supplier and configured to spray the cleaning agent onto the substrate holder to remove the contamination. The receiver is coupled to the arm and configured to receive the cleaning agent after the cleaning agent is sprayed onto the substrate holder.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.