Cobalt-containing compounds, their synthesis, and use in cobalt-containing film deposition
US10309010B2 · kind B2 · utility
0Cited by
3References
18Claims
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Key dates
| Filing date | Jan 31, 2014 |
| Grant date | Jun 4, 2019 |
| Priority date | — |
| Expiry date | Apr 13, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76841
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Cobalt-containing compounds, their synthesis, and their use for the deposition of cobalt containing films are disclosed. The disclosed cobalt-containing compounds have one of the following formulae: wherein each of R1, R2, R3, R4 and R5 is independently selected from the group consisting of hydrogen and linear, cyclic, or branched hydrocarbon groups; provided that (a) R1≠R2 and/or R3 when R1 and R2 and R3 are a hydrocarbon group; (b) R1 and R2 are a hydrocarbon group when R3 is H; or (c) R1 is a C2-C4 hydrocarbon group when R2 and R3 are H.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.