Multiple channel locating
US10317193B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 29, 2017 |
| Grant date | Jun 11, 2019 |
| Priority date | — |
| Expiry date | Jul 12, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/89
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods, systems, and apparatuses are provided for estimating a location on an object in a three-dimensional scene. Multiple radiation patterns are produced by spatially modulating each of multiple first radiations with a distinct combination of one or more modulating structures, each first radiation having at least one of a distinct radiation path, a distinct source, a distinct source spectrum, or a distinct source polarization with respect to the other first radiations. The location on the object is illuminated with a portion of each of two or more of the radiation patterns, the location producing multiple object radiations, each object radiation produced in response to one of the multiple radiation patterns. Multiple measured values are produced by detecting the object radiations from the location on the object due to each pattern separately using one or more detector elements. The location on the object is estimated based on the multiple measured values.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.