Pattern matching method and apparatus
US10318805B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2013 |
| Grant date | Jun 11, 2019 |
| Priority date | — |
| Expiry date | Mar 3, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
When the degree of matching between patterns decreases due to a pattern fluctuation or an appearance fluctuation that has occurred during manufacturing steps, a heavy work burden would be placed on an operator. A data processing unit of a pattern matching apparatus calculates a threshold for determination of matching between a first template image and a partial region of a search target image obtained by capturing an image of the surface of a sample, on the basis of a result of evaluation of a similarity between the search target image and a second template image, the second template image having been captured in a wider range than the first template image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.