Apparatus for supplying power and apparatus for treating substrate including the same
US10319566B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2018 |
| Grant date | Jun 11, 2019 |
| Priority date | — |
| Expiry date | Apr 25, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H7/40
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed inventions are apparatus for supplying power and an apparatus for treating a substrate including the same. The apparatus for supplying power includes a high-frequency power source that provides a high-frequency power; a plasma source including first and second antennas that generates plasma by using the high-frequency power; and a power divider connected between the high-frequency power source and the plasma source to divide the high-frequency power supplied to the first and second antennas. The power divider includes a first variable device that controls the high-frequency power supplied to the first and second antennas; and a second variable device that compensates for non-linearity of the high-frequency power supplied to the first and second antennas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.