Patent · US Active

Gas inlet element of a CVD reactor with weight-reduced gas outlet plate

US10323322B2 · kind B2 · utility

0Cited by

2References

15Claims

0Family size

Assignee

AIXTRON SE · DE

Inventors

Baskar Pagadala Gopi · Aachen, DE
Michael D. Long · Santa Cruz, US
Markus Gersdorff · Salzburg, AT

Key dates

Filing date	Dec 17, 2014
Grant date	Jun 18, 2019
Priority date	—
Expiry date	Dec 4, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32449
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A device for carrying out a CVD process comprises a gas inlet element, which is arranged in a reactor housing and has a gas outlet plate, which faces a process chamber, comprises a porous material and has a multiplicity of gas outlet openings, which are fed with process gases from a gas distributing volume arranged in the gas inlet element. In order to improve production aspects of a gas inlet element, in particular for a CVD reactor with a large coating area, it is proposed that the porous material forms the core of the gas outlet plate, the surface segments of which that come into contact with the process gas are sealed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.