High productivity soak anneal system
US10325789B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 18, 2016 |
| Grant date | Jun 18, 2019 |
| Priority date | — |
| Expiry date | Sep 1, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68742
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments described herein relate to apparatus and methods for thermally processing substrates. In one embodiment, a processing system includes a factory interface coupled to a plurality of load lock chambers. The plurality of load lock chambers are coupled to a transfer chamber which houses a robot. A thermal processing chamber is coupled to the transfer chamber and the robot is configured to transfer substrate between the load lock chambers and the thermal processing chamber. A multi-substrate support, which is disposed within the thermal processing chamber, rotates to facilitate efficient substrate thermal processing. A gas curtain apparatus disposed in a port plenum provides environment separation between the processing chamber and the transfer chamber while enabling efficient substrate transfer between the thermal processing chamber and the transfer chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.