Patent · US Active

Adjusting a beam diameter and an aperture angle of a laser beam

US10327318B2 · kind B2 · utility

2Cited by

6References

20Claims

0Family size

Assignee

TRUMPF Lasersystems for Semiconductor Manufacturing GmbH · DE

Inventors

Martin Lambert · Buckingham, GB
Tolga Ergin · Bietigheim-Bissingen, DE
Thomas Schwarzbaeck · Ditzingen, DE

Key dates

Filing date	Jul 21, 2017
Grant date	Jun 18, 2019
Priority date	—
Expiry date	Jul 21, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/10
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Beam guiding devices for guiding a laser beam, in particular in a direction towards a target region for producing extreme ultraviolet (EUV) radiation, include an adjustment device for adjusting a beam diameter and an aperture angle of the laser beam. The adjustment device includes a first mirror having a first curved reflecting surface, a second mirror having a second curved reflecting surface, a third mirror having a third curved reflecting surface, a fourth mirror having a fourth curved reflecting surface, and a movement device configured to adjust the beam diameter and the aperture angle of the laser beam by moving the first reflecting surface and the fourth reflecting surface relative to one another and, independently thereof, moving the second reflecting surface and the third reflecting surface together relative to the first reflecting surface and the fourth reflecting surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.