Monomer, organic layer composition, organic layer, and method of forming patterns
US10332751B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Dec 28, 2015 |
| Grant date | Jun 25, 2019 |
| Priority date | — |
| Expiry date | Dec 28, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31138
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.