Yu-Shin Park
6Patents
2h-index
27Co-inventors
40Inventor score
Filing activity: Apr 22, 2014 → Jun 3, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9665003B2 | Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns | Physics | 2 | Active |
| US10066057B2 | Organic layer composition, organic layer, and method of forming patterns | Electricity | 2 | Active |
| US9971243B2 | Polymer, organic layer composition, organic layer, and method of forming patterns | Chemistry; Metallurgy | 2 | Active |
| US10332751B2 | Monomer, organic layer composition, organic layer, and method of forming patterns | Electricity | 0 | Active |
| US10345706B2 | Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition | Chemistry; Metallurgy | 0 | Active |
| US9371444B2 | Hardmask composition and method of forming patterns using the hardmask composition | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.