Patent · US Active

Method for producing a lens for a lithography apparatus, and measurement system

US10345547B2 · kind B2 · utility

0Cited by

0References

28Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Steffen Fritzsche · Tholey, DE
Juergen Baier · Oberkochen, DE
Rolf Freimann · Aalen, DE

Key dates

Filing date	Nov 15, 2017
Grant date	Jul 9, 2019
Priority date	—
Expiry date	Nov 15, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for producing a lens for a lithography apparatus is disclosed. A measurement system for ascertaining an optical characteristic of a partial lens for a lithography apparatus is also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.