Juergen Baier
7Patents
1h-index
17Co-inventors
44Inventor score
Filing activity: Dec 14, 2012 → Apr 12, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10514608B2 | Method for producing an illumination system for an EUV projection exposure system, and illumination system | Physics | 3 | Active |
| US9213245B2 | Optical system and multi facet mirror of a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US10386733B2 | Optical system | Physics | 1 | Active |
| US12346033B2 | Optical system | Physics | 0 | Active |
| US11048172B2 | Method for producing an illumination system for an EUV projection exposure system, and illumination system | Physics | 0 | Active |
| US10345547B2 | Method for producing a lens for a lithography apparatus, and measurement system | Physics | 0 | Active |
| US11803762B2 | Computer-implemented knowledge management platform and a computer-implemented knowledge management method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.