Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
US10345706B2 · kind B2 · utility
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Key dates
| Filing date | Apr 22, 2014 |
| Grant date | Jul 9, 2019 |
| Priority date | — |
| Expiry date | Apr 22, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/54
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A monomer for a hardmask composition is represented by the following Chemical Formula 1,
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.