Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a wafer
US10353295B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 22, 2016 |
| Grant date | Jul 16, 2019 |
| Priority date | — |
| Expiry date | Jan 22, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for generating a predetermined three-dimensional contour of a component and/or a wafer comprises: (a) determining a deviation of an existing three-dimensional contour of the component and/or the wafer from the predetermined three-dimensional contour; (b) calculating at least one three-dimensional arrangement of laser pulses having one or more parameter sets defining the laser pulses for correcting the determined existing deviation of the three-dimensional contour from the predetermined three-dimensional contour; and (c) applying the calculated at least one three-dimensional arrangement of laser pulses on the component and/or the wafer for generating the predetermined three-dimensional contour.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.