Bernd Geh
19Patents
5h-index
43Co-inventors
62Inventor score
Filing activity: Sep 19, 2002 → Feb 24, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7198873B2 | Lithographic processing optimization based on hypersampled correlations | Physics | 30 | Expired |
| US6678240B2 | Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements | Physics | 14 | Expired |
| US8120748B2 | Lithographic processing optimization based on hypersampled correlations | Physics | 6 | Active |
| US7684013B2 | Lithographic apparatus and device manufacturing method | Physics | 6 | Active |
| US6934011B2 | Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements | Physics | 5 | Expired |
| US7818151B2 | Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool | Physics | 2 | Active |
| US10353295B2 | Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a wafer | Electricity | 2 | Active |
| US7301622B2 | Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements | Physics | 2 | Expired |
| US8339574B2 | Lithographic apparatus and device manufacturing method | Physics | 2 | Active |
| US7423727B2 | Lithographic apparatus and device manufacturing method | Physics | 1 | Expired |
| US10852643B2 | Optical system, and method | Physics | 1 | Active |
| US7581305B2 | Method of manufacturing an optical component | Emerging Cross-Sectional Technologies | 1 | Expired |
| US10607873B2 | Substrate edge detection | Electricity | 1 | Active |
| US7961297B2 | Method for determining intensity distribution in the image plane of a projection exposure arrangement | Physics | 1 | Active |
| US8212988B2 | Projection objective for microlithography | Physics | 0 | Active |
| US9568838B2 | Projection objective for microlithography | Physics | 0 | Active |
| US7952685B2 | Illuminator for a lithographic apparatus and method | Physics | 0 | Active |
| US9217932B2 | Projection objective for microlithography | Physics | 0 | Active |
| US11366382B2 | Method and apparatus for performing an aerial image simulation of a photolithographic mask | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.