Method of utilizing information on shape of frequency distribution of inspection result in a pattern inspection apparatus
US10354375B2 · kind B2 · utility
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Key dates
| Filing date | Jun 29, 2016 |
| Grant date | Jul 16, 2019 |
| Priority date | — |
| Expiry date | Oct 30, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V2201/06
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A pattern inspection method includes: generating an image of an inspection area including a pattern to be inspected; obtaining, from the image, measured values representing two-dimensional shape information of the pattern to be inspected; producing a frequency distribution of the measured values; calculating a statistic of the measured values; calculating a change in the statistic while carrying out an inspection operation which comprises repeating the processes from generating the image to calculating the statistic; and terminating the inspection operation if the change in the statistic is smaller than a threshold value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.