Monomer, organic layer composition, organic layer, and method of forming patterns
US10364221B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Jun 8, 2016 |
| Grant date | Jul 30, 2019 |
| Priority date | — |
| Expiry date | Jun 8, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/094
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A monomer, an organic layer composition, an organic layer, and a method of forming a pattern, the monomer being represented by the following Chemical Formula 1:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.