Hyo-Young Kwon
18Patents
2h-index
43Co-inventors
43Inventor score
Filing activity: Nov 21, 2012 → Sep 19, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9556094B2 | Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition | Physics | 3 | Active |
| US10066057B2 | Organic layer composition, organic layer, and method of forming patterns | Electricity | 2 | Active |
| US9971243B2 | Polymer, organic layer composition, organic layer, and method of forming patterns | Chemistry; Metallurgy | 2 | Active |
| US10392459B2 | Photocurable composition and device including barrier layer formed from composition | Chemistry; Metallurgy | 1 | Active |
| US9873815B2 | Polymer, organic layer composition, and method of forming patterns | Electricity | 1 | Active |
| US9725389B2 | Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition | Electricity | 1 | Active |
| US9593205B2 | Polymer, organic layer composition, organic layer, and method of forming patterns | Chemistry; Metallurgy | 1 | Active |
| US10340148B2 | Polymer, organic layer composition, and method of forming patterns | Physics | 1 | Active |
| US9359276B2 | Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition | Chemistry; Metallurgy | 1 | Active |
| US9758612B2 | Polymer, organic layer composition, organic layer, and method of forming patterns | Electricity | 1 | Active |
| US9329475B2 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device | Chemistry; Metallurgy | 1 | Active |
| US9195136B2 | Resist underlayer composition, method of forming patterns and semiconductor integrated circuit device including the patterns | Physics | 0 | Active |
| US10323124B2 | Polymer, organic layer composition, organic layer, and method of forming patterns | Chemistry; Metallurgy | 0 | Active |
| US9606438B2 | Resist underlayer composition, method of forming patterns, and semiconductor integrated circuit device including the pattern | Physics | 0 | Active |
| US10556986B2 | Polymer, organic layer composition, and method of forming patterns | Chemistry; Metallurgy | 0 | Active |
| US9862668B2 | Monomer, polymer, organic layer composition, organic layer, and method of forming patterns | Chemistry; Metallurgy | 0 | Active |
| US8956790B2 | Positive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the same | Physics | 0 | Active |
| US10364221B2 | Monomer, organic layer composition, organic layer, and method of forming patterns | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.