Exhaust apparatus and substrate processing apparatus having an exhaust line with a first ring having at least one hole on a lateral side thereof placed in the exhaust line
US10364493B2 · kind B2 · utility
4Cited by
298References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 8, 2017 |
| Grant date | Jul 30, 2019 |
| Priority date | — |
| Expiry date | Aug 8, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32834
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An exhaust apparatus using a gas curtain instead of a mechanical opening/closing structure is provided. The exhaust apparatus includes: a first region; a second region connected to the first region; a third region connected to the first region; and a first gas line connected to the second region, wherein when gas is supplied to the first gas line, the first region does not communicate with the second region but communicates with the third region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.