Scatterometry overlay based on reflection peak locations
US10365230B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 18, 2015 |
| Grant date | Jul 30, 2019 |
| Priority date | — |
| Expiry date | Jul 6, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/127
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Metrology methods and modules are provided, which comprise measuring intensity spatial distributions and peaks of spots at the pupil plane of a metrology system that correspond to various diffraction orders scattered from target cells and calculating overlay(s) of the target cell(s) from the measured intensity spatial distributions and peaks. For example, intensity peak or distribution of zeroth diffraction orders from four cells, first diffraction orders from two cells as well as diffraction orders from a single cell may be used to derive an overlay estimation, which may also be compared to standard overlay measurements for different purposes. Intensity spatial distributions may also be used to derive weight function for adjusting measurements or the metrology system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.