Inventor · Haifa, IL

Eran Amit

32Patents
5h-index
56Co-inventors
68Inventor score

Filing activity: Apr 4, 2012 → Mar 8, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US10473460B2 Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals Electricity 15 Active
US10527951B2 Compound imaging metrology targets Physics 13 Active
US8913237B2 Device-like scatterometry overlay targets Electricity 8 Active
US9329033B2 Method for estimating and correcting misregistration target inaccuracy Physics 6 Active
US10274837B2 Metrology target for combined imaging and scatterometry metrology Physics 5 Active
US11006860B1 Method and apparatus for gait analysis Human Necessities 4 Active
US11119417B2 Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s) Physics 3 Active
US9874527B2 Removing process-variation-related inaccuracies from scatterometry measurements Physics 2 Active
US11248905B2 Machine learning in metrology measurements Physics 2 Active
US10571811B2 Device metrology targets and methods Electricity 2 Active
US11085754B2 Enhancing metrology target information content Physics 1 Active
US10365230B1 Scatterometry overlay based on reflection peak locations Physics 1 Active
US10303835B2 Method and apparatus for direct self assembly in target design and production Emerging Cross-Sectional Technologies 1 Active
US10415963B2 Estimating and eliminating inter-cell process variation inaccuracy Physics 1 Active
US10699969B2 Quick adjustment of metrology measurement parameters according to process variation Electricity 1 Active
US10685165B2 Metrology using overlay and yield critical patterns Emerging Cross-Sectional Technologies 1 Active
US10551749B2 Metrology targets with supplementary structures in an intermediate layer Physics 1 Active
US11756687B2 Method and system for assessing performance Physics 1 Active
US11372340B2 Method and system for providing a quality metric for improved process control Physics 1 Active
US11054752B2 Device metrology targets and methods Electricity 0 Active
US10504802B2 Target location in semiconductor manufacturing Electricity 0 Active
US10025285B2 On-product derivation and adjustment of exposure parameters in a directed self-assembly process Physics 0 Active
US10763146B2 Recipe optimization based zonal analysis Electricity 0 Active
US11709433B2 Device-like metrology targets Physics 0 Active
US12117347B2 Metrology target design for tilted device designs Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.