Resist composition and method for producing resist pattern
US10365560B2 · kind B2 · utility
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Key dates
| Filing date | Mar 30, 2016 |
| Grant date | Jul 30, 2019 |
| Priority date | — |
| Expiry date | Mar 30, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/40
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition contains: a resin having a structural unit represented by formula (I), an alkali-soluble resin, an acid generator, and a solvent: wherein Ri51 represents a hydrogen atom or a methyl group, Ri52 and Ri53 each independently represent a hydrogen atom or a C1 to C12 hydrocarbon group, Ri54 represents a C5 to C20 alicyclic hydrocarbon group, Ri55 represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group, and “p” represents an integer of 0 to 4.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.