Masako Sugihara
20Patents
4h-index
13Co-inventors
56Inventor score
Filing activity: May 25, 2010 → Feb 18, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8318403B2 | Salt and photoresist composition containing the same | Chemistry; Metallurgy | 13 | Active |
| US8354217B2 | Salt and photoresist composition containing the same | Physics | 8 | Active |
| US8367298B2 | Salt and photoresist composition containing the same | Physics | 8 | Active |
| US8609317B2 | Salt and photoresist composition containing the same | Emerging Cross-Sectional Technologies | 4 | Active |
| US8278023B2 | Salt and photoresist composition containing the same | Physics | 2 | Active |
| US9182663B2 | Photoresist composition | Physics | 1 | Active |
| US9221785B2 | Salt and photoresist composition containing the same | Physics | 1 | Active |
| US8765351B2 | Salt and photoresist composition containing the same | Physics | 1 | Active |
| US9346750B2 | Salt and photoresist composition containing the same | Physics | 1 | Active |
| US8318404B2 | Salt and photoresist composition containing the same | Chemistry; Metallurgy | 0 | Active |
| US8481242B2 | Salt and photoresist composition containing the same | Chemistry; Metallurgy | 0 | Active |
| US12164229B2 | Resist composition and method for producing resist pattern | Physics | 0 | Active |
| US10101657B2 | Resin, resist composition and method for producing resist pattern | Physics | 0 | Active |
| US9726976B2 | Photoresist composition | Physics | 0 | Active |
| US11561471B2 | Photoresist composition | Physics | 0 | Active |
| US8614046B2 | Salt and photoresist composition containing the same | Emerging Cross-Sectional Technologies | 0 | Active |
| US10969685B2 | Photoresist composition | Physics | 0 | Active |
| US9740097B2 | Resist composition and method for producing resist pattern | Physics | 0 | Active |
| US11543749B2 | Resist composition and method for producing resist pattern, and method for producing plated molded article | Physics | 0 | Active |
| US10365560B2 | Resist composition and method for producing resist pattern | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.