Methods and systems for printing arrays of features
US10365566B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 14, 2016 |
| Grant date | Jul 30, 2019 |
| Priority date | — |
| Expiry date | Dec 14, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7035
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.