Eulitha AG
16Patents
16Active
16Granted
45Portfolio score
Filing activity: Jun 24, 2005 → Mar 27, 2020 · 4 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9280056B2 | Method and system for printing high-resolution periodic patterns | Physics | 12 | Active |
| US8368871B2 | Lithographic fabrication of general periodic structures | Physics | 8 | Active |
| US8525973B2 | Method and apparatus for printing periodic patterns | Physics | 7 | Active |
| US8524443B2 | Method and apparatus for printing a periodic pattern with a large depth of focus | Physics | 4 | Active |
| US9036133B2 | Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions | Physics | 4 | Active |
| US8904316B2 | Method and apparatus for printing high-resolution two-dimensional periodic patterns | Physics | 4 | Active |
| US8617775B2 | Optimized mask design for fabricating periodic and quasi-periodic patterns | Physics | 4 | Active |
| US9007566B2 | Apparatus and method for printing a periodic pattern with a large depth of focus | Physics | 3 | Active |
| US8841046B2 | System and a method for generating periodic and/or quasi-periodic pattern on a sample | Physics | 3 | Active |
| US9182672B2 | System and method for production of nanostructures over large areas | Physics | 3 | Active |
| US9658535B2 | Methods and systems for printing periodic patterns | Physics | 2 | Active |
| US7858268B2 | Method for generating a circular periodic structure on a basic support material | Physics | 1 | Active |
| US10025197B2 | Method for printing colour images | Physics | 0 | Active |
| US10365566B2 | Methods and systems for printing arrays of features | Physics | 0 | Active |
| US11422471B2 | Methods and systems for printing large periodic patterns by overlapping exposure fields | Physics | 0 | Active |
| US12124170B2 | Method and apparatus for printing a periodic pattern with a varying duty cycle | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.