Patent · US Active

Method and apparatus for determining the position of structure elements of a photolithographic mask

US10380733B2 · kind B2 · utility

0Cited by

1References

24Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Dirk Seidel · Jena, DE
Steffen Steinert · Jena, DE

Key dates

Filing date	Jul 8, 2016
Grant date	Aug 13, 2019
Priority date	—
Expiry date	Sep 13, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/30148
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

The invention relates to a method and an apparatus for determining a position of at least one structure element of a photolithographic mask, wherein the method comprises the following steps: (a) providing a reference image of the at least one structure element; (b) deriving a data record for the reference image, said data record comprising metadata relating to the reference image; (c) providing at least one measured image of the at least one structure element of the photolithographic mask; and (d) optimizing the reference image by use of the derived data record and correlating the at least one measured image and the optimized reference image.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.