Patent · US Active

Wafer-based charged particle accelerator, wafer components, methods, and applications

US10383205B2 · kind B2 · utility

2Cited by

3References

5Claims

0Family size

Assignee

Cornell University · IT

Inventors

Amit Lal · Ithaca, US
Thomas Schenkel · San Francisco, US
Arun Persaud · Corona, US
Qing Ji · Albany, US
Peter Seidl · Oakland, US
Will Waldron · Berkeley, US
Serhan Ardanuc · Ithaca, US
Vinaya Kumar Kadayra Basavarajappa · Ithaca, US

Key dates

Filing date	May 4, 2017
Grant date	Aug 13, 2019
Priority date	—
Expiry date	May 4, 2037

Classification

Technology area (CPC H)Electricity
CPC primaryH05H2007/045
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.