Ebeam staggered beam aperture array
US10386722B2 · kind B2 · utility
1Cited by
3References
24Claims
0Family size
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Key dates
| Filing date | Dec 19, 2014 |
| Grant date | Aug 20, 2019 |
| Priority date | — |
| Expiry date | May 20, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31764
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction and having a pitch. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings. The second column of openings has the pitch. A scan direction of the BAA is along a second direction, orthogonal to the first direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.